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  • 产品名称: PVD V201硬质涂层设备

主要技术参数与配置:

1.真空室容积:φ1000*1200mm      
2.有效镀膜区:φ700*850mm
3.可移出式转架:无需定位,可任意位置移出,传动可靠(专利技术)
4.阴极电弧:φ160mm或φ140mm双驱动动态磁控阴极电弧*8
5.IET离子刻蚀源

Configuration:

Ⅰ.Vacuum chamber volume:Φ1000mm*h1200mm    
Ⅱ.Effective coating area:Φ700*850mm
Ⅲ.Carousel:Removable
Ⅳ.Φ160mm or Φ140mm dynamic magnetically controlled cathode arc*8
Ⅴ.IET *1

技术特点:

该系列采用动态双驱动磁控阴极电弧技术,离化率高。可制备TiN、CrN、TiAlN、AlTiN、AlCrN、AlCrSiN等单层或多层膜系。高效的涂层前离子刻蚀技术,保证了涂层的结合力及性能。该系列设备在镀膜过程中无需打底层(过渡层),直接成膜,沉积效率高。

 Technical feature:

The series adopts dynamic dual drive magnetron cathodic arc technology with high ionization rate. Monolayer or multilayer films such as TiN, CrN, TiAlN, AlTiN, AlCrN and AlCrSiN can be made.High efficiency pre-coating IE technology ensures the adhesion and performance of the coating. This series of equipment does not need to make the bottom layer (transition layer) in the process of coating, directly forming the film, and has high deposition efficiency.