• 产品名称: PVD1112硬质镀膜设备

主要技术参数与配置:
 

1.真空室容积:φ1100*1200mm
2.有效镀膜区:φ700*850mm
3.可移出式转架:无需定位,可任意位置移出,传动可靠
4.阴极电弧:φ160mm或φ140mm双驱动动态磁控阴极电弧*12
5.IET离子刻蚀源:1套

Configuration:

Ⅰ.Vacuum chamber volume:Φ1100mm*h1200mm
Ⅱ.Effective coating area:Φ700*850mm
Ⅲ.Carousel:Removable
Ⅳ.Φ160mm or Φ140mm dynamic magnetically controlled cathode arc*12
Ⅴ.IET *1

技术特点:

该设备在PVD1012硬质涂层设备(8弧)的基础上进行升级,阴极电弧的数量升级为12个(3组)。PVD1112的设计让现场维护和保养十分方便,系统可以从两侧打开,所有系统部件都伸手可及。
 
Technical feature:

The equipment is upgraded on the basis of PVD1012 hard coating equipment (8 arcs), and the number of cathode arcs is upgraded to 12 (3 sets).The design of PVD1112 is very convenient for on-site maintenance. The system can be opened from both sides, and all the components of the system can be reached.